Potential photoacid generators based on oxime sulfonates

M John Plater* (Corresponding Author), William T A Harrison, Ross Killah

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)
7 Downloads (Pure)


The bis-oxime of acenaphthenequinone and the mono-oxime of benzil have been sulfonated by reaction with 4-methylbenzenesulfonyl chloride and propylsulfonyl chloride. The four sulfonated oximes were characterised by X-ray single crystal structure determinations. Some photochemical decompositions were studied using a 6 W 254 nm immersion well lamp in dichloromethane. The 4-methylbenzenesulfonate bis-oxime of acenaphthenequinone and the 4-methylbenzenesulfonate mono-oxime of benzil both give 4-methylbenzenesulfonic acid upon irradiation but not 4-methylbenzenesulfinic acid. Fragmentation pathways are discussed. The possible use of these compounds as photoacid generators in polymer resists and the role of secondary reactions to liberate acid is discussed.
Original languageEnglish
Pages (from-to)26-33
Number of pages9
JournalJournal of Chemical Research
Issue number1-2
Publication statusPublished - 13 May 2019

Bibliographical note

We are grateful to the National Mass Spectrometry Foundation, University of Swansea, and to the National Crystallographic Service Center, University of Southampton.


  • photoacid generator (PAG)
  • oxime sulfonates
  • acenaphthenequinone
  • benzil
  • Benzil
  • Acenaphthenequinone
  • Oxime sulfonates
  • Photoacid generator


Dive into the research topics of 'Potential photoacid generators based on oxime sulfonates'. Together they form a unique fingerprint.

Cite this