Preferred orientation in erbium thin films observed using synchrotron radiation

M. A. Player*, G. V. Marr, E. Gu, H. Savaloni, N. Oncan, I. H. Munro

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)


This paper described the use of energy-dispersive diffraction using synchrotron radiation to obtain preliminary measurements of pole figures for a 6000 A erbium film deposited by UHV evaporation on molybdenum substrates. A low glancing angle is used and the pole-figure polar distance is scanned by rotating the sample about the direction of the incident beam. Correction formulae are derived for pole-figure intensity and position in this geometry. Results confirm strong 002 orientation of films deposited at a 673 K substrate temperature (near the middle of zone II for erbium), show that at an ambient substrate temperature (zone I) there is a mixture of 002 and 101 orientations, and demonstrate strong dependence of the 002 orientation direction (for zone II temperatures) on the angle of vapour incidence during deposition.

Original languageEnglish
Pages (from-to)770-777
Number of pages8
JournalJournal of Applied Crystallography
Issue numberpt 6
Publication statusPublished - 1992


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